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2024 Vol.34, Issue 3 Preview Page

Research Paper

27 March 2024. pp. 152-162
Abstract
References
1
S. Gao, X. Yi, J. Shang, G. Liu and R.-W. Li, Chem. Soc. Rev., 48, 1531 (2019). 10.1039/C8CS00614H30398508
2
J. Bera, A. Betal, A. Sharma, U. Shankar, A. K. Rath and S. Sahu, ACS Appl. Nano Mater., 5, 8502 (2022). 10.1021/acsanm.2c01894
3
J. S. Meena, S. M. Sze, U. Chand and T.-Y. Tseng, Nanoscale Res. Lett., 9, 526 (2014). 10.1186/1556-276X-9-52625278820PMC4182445
4
H. Lee, P. Chen, T. Wu, Y. Chen, C. Wang, P. Tzeng, C. Lin, F. Chen, C. Lien and M.-J. Tsai, in Proceedings of the 2008 IEEE International Electron Devices Meeting (San Francisco, CA, December 2008) p. 1-4.
5
Y. Hosoi, Y. Tamai, T. Ohnishi, K. Ishihara, T. Shibuya, Y. Inoue, S. Yamazaki, T. Nakano, S. Ohnishi and N. Awaya, in Proceedings of the 2006 International Electron Devices Meeting (San Francisco, CA, December 2006) p. 1-4.
6
R. Waser and M. Aono, Nat. Mater., 6, 833 (2007). 10.1038/nmat202317972938
7
D. Kumar, R. Aluguri, U. Chand and T.-Y. Tseng, Ceram. Int., 43, S547 (2017). 10.1016/j.ceramint.2017.05.289
8
M. J. Lee, S. I. Kim, C. B. Lee, H. Yin, S. E. Ahn, B. S. Kang, K. H. Kim, J. C. Park, C. J. Kim and I. Song, Adv. Funct. Mater., 19, 1587 (2009). 10.1002/adfm.200801032
9
B. Choi, D. S. Jeong, S. Kim, C. Rohde, S. Choi, J. Oh, H. Kim, C. Hwang, K. Szot and R. Waser, J. Appl. Phys., 98, 033715 (2005). 10.1063/1.2001146
10
F. M. Simanjuntak, D. Panda, K.-H. Wei and T.-Y. Tseng, Nanoscale Res. Lett., 11, 368 (2016). 10.1186/s11671-016-1570-y27541816PMC4991985
11
A. Sawa, Mater. Today, 11, 28 (2008). 10.1016/S1369-7021(08)70119-6
12
F. Pontes, E. Longo, E. Leite and J. A. Varela, Thin Solid Films, 386, 91 (2001). 10.1016/S0040-6090(01)00781-7
13
M.-J. Lee, C. B. Lee, D. Lee, S. R. Lee, M. Chang, J. H. Hur, Y.-B. Kim, C.-J. Kim, D. H. Seo and S. Seo, Nat. Mater., 10, 625 (2011). 10.1038/nmat307021743450
14
L. Qingjiang, A. Khiat, I. Salaoru, C. Papavassiliou, X. Hui and T. Prodromakis, Sci. Rep., 4, 4522 (2014). 10.1038/srep0452224682245PMC3970129
15
M. H. Lee, K. M. Kim, G. H. Kim, J. Y. Seok, S. J. Song, J. H. Yoon and C. S. Hwang, Appl. Phys. Lett., 96, 152909 (2010). 10.1063/1.3446646
16
S. M. George, Chem. Rev., 110, 111 (2010). 10.1021/cr900056b19947596
17
C. Liu, L.-G. Wang, K. Qin, Y.-Q. Cao, X.-J. Zhang, D. Wu and A.-D. Li, IEEE Trans. Electron Devices, 65, 4674 (2018). 10.1109/TED.2018.2866168
18
M. Xiao, K. P. Musselman, W. W. Duley and Y. N. Zhou, ACS Appl. Mater. Interfaces, 9, 4808 (2017). 10.1021/acsami.6b1420628098978
19
P. S. Schulze, K. Wienands, A. J. Bett, S. Rafizadeh, L. E. Mundt, L. Cojocaru, M. Hermle, S. W. Glunz, H. Hillebrecht and J. C. Goldschmidt, Thin Solid Films, 704, 137970 (2020). 10.1016/j.tsf.2020.137970
20
H. Park, S. Joo, J.-P. Choi and W.-B. Kim, J. Powder Mater., 22, 396 (2015). 10.4150/KPMI.2015.22.6.396
21
S. H. Ji, H. Park, D. Kim, D. H. Han, H. W. Yun and W.-B. Kim, Korean J. Mater. Res., 29, 183 (2019). 10.3740/MRSK.2019.29.3.183
22
J. Lee, J. Hwang, H. Park, T. Sekino and W.-B. Kim, Appl. Surf. Sci., 540, 148399 (2021). 10.1016/j.apsusc.2020.148399
23
J. Lee, R. N. Kim, K.-R. Park and W.-B. Kim, Appl. Surf. Sci., 562, 150170 (2021). 10.1016/j.apsusc.2021.150170
24
C.-C. Hsieh, A. Roy, A. Rai, Y.-F. Chang and S. K. Banerjee, Appl. Phys. Lett., 106, 173108 (2015). 10.1063/1.4919442
25
S. Kim, T.-H. Kim, H. Kim and B.-G. Park, Appl. Phys. Lett., 117, 202106 (2020). 10.1063/5.0027757
26
D. Panda, C. Chu, A. Pradhan, S. Chandrasekharan, B. Pattanayak, S. Sze and T. Tseng, Semicond. Sci. Technol., 36, 045002 (2021). 10.1088/1361-6641/abe31a
27
Y.-J. Choi, M.-H. Kim, S. Bang, T.-H. Kim, D. K. Lee, K. Hong, C. S. Kim, S. Kim, S. Cho and B.-G. Park, IEEE Access, 8, 228720 (2020). 10.1109/ACCESS.2020.3046300
28
Y.-P. Hsiao, W.-L. Yang, L.-M. Lin, F.-T. Chin, Y.-H. Lin, K.-L. Yang and C.-C. Wu, Microelectron. Reliab., 55, 2188 (2015). 10.1016/j.microrel.2015.08.013
29
N. Naseri, H. Kim, W. Choi and A. Moshfegh, Int. J. Hydrogen Energy, 37, 3056 (2012). 10.1016/j.ijhydene.2011.11.041
30
E. Albiter, M. Valenzuela, S. Alfaro, G. Valverde-Aguilar and F. Martínez-Pallares, J. Saudi Chem. Soc., 19, 563 (2015). 10.1016/j.jscs.2015.05.009
31
Z. Wang, S. Joshi, S. E. Savel'ev, H. Jiang, R. Midya, P. Lin, M. Hu, N. Ge, J. P. Strachan and Z. Li, Nat. Mater., 16, 101 (2017). 10.1038/nmat475627669052
32
H. Yeon, P. Lin, C. Choi, S. H. Tan, Y. Park, D. Lee, J. Lee, F. Xu, B. Gao and H. Wu, Nat. Nanotechnol., 15, 574 (2020). 10.1038/s41565-020-0694-532514010
33
H.-S. P. Wong, H.-Y. Lee, S. Yu, Y.-S. Chen, Y. Wu, P.-S. Chen, B. Lee, F. T. Chen and M.-J. Tsai, Proc. IEEE, 100, 1951 (2012). 10.1109/JPROC.2012.2190369
34
K.-C. Kwon, M.-J. Song, K.-H. Kwon, H.-V. Jeoung, D.-W. Kim, G.-S. Lee, J.-P. Hong and J.-G. Park, J. Mater. Chem. C, 3, 9540 (2015). 10.1039/C5TC01342A
35
R.-C. Fang, Q.-Q. Sun, P. Zhou, W. Yang, P.-F. Wang and D. W. Zhang, Nanoscale Res. Lett., 8, 92 (2013). 10.1186/1556-276X-8-9223421424PMC3663830
36
T. Wang, H. Xiao, Y. Gao, J. Xu, Z. Zhang, H. Bian and T. Sun, J. Mater. Sci.: Mater. Electron., 31, 11496 (2020). 10.1007/s10854-020-03697-w
37
C. Su, L. Liu, M. Zhang, Y. Zhang and C. Shao, CrystEngComm, 14, 3989 (2012). 10.1039/c2ce25161b
38
M. Padilla Villavicencio, A. Escobedo Morales, M. d. L. Ruiz Peralta, M. Sánchez-Cantú, L. Rojas Blanco, E. Chigo Anota, J. H. Camacho García and F. Tzompantzi, Catal. Lett., 150, 2385 (2020). 10.1007/s10562-020-03139-6
39
H. W. Chen, Y. Ku and Y. L. Kuo, Chem. Eng. Technol., 30, 1242 (2007). 10.1002/ceat.200700196
40
A. Regoutz, I. Gupta, A. Serb, A. Khiat, F. Borgatti, T. L. Lee, C. Schlueter, P. Torelli, B. Gobaut and M. Light, Adv. Funct. Mater., 26, 507 (2016). 10.1002/adfm.201503522
41
S. Yu and H.-S. P. Wong, IEEE Trans. Electron Devices, 58, 1352 (2011). 10.1109/TED.2011.2116120
42
L. Gao, Y. Li, Q. Li, Z. Song and F. Ma, Nanotechnology, 28, 215201 (2017). 10.1088/1361-6528/aa6cd028462908
43
Y. Chen, H. Lee, P. Chen, P. Gu, C. Chen, W. Lin, W. Liu, Y. Hsu, S. Sheu and P. Chiang, in Proceedings of the 2009 IEEE International Electron Devices Meeting (IEDM) (Baltimore, MD, December 2009) p. 1-4.
44
W. Guan, S. Long, R. Jia and M. Liu, Appl. Phys. Lett., 91, 062111 (2007). 10.1063/1.2760156
45
A. Hao, M. Ismail, S. He, N. Qin, W. Huang, J. Wu and D. Bao, RSC Adv., 7, 46665 (2017). 10.1039/C7RA08756J
46
Y. Huang, Z. Shen, Y. Wu, X. Wang, S. Zhang, X. Shi and H. Zeng, RSC Adv., 6, 17867 (2016). 10.1039/C5RA22728C
47
Y.-L. Chung, W.-H. Cheng, J.-S. Jeng, W.-C. Chen, S.-A. Jhan and J.-S. Chen, J. Appl. Phys., 116, 164502 (2014). 10.1063/1.4899319
48
Y. Xia, B. Sun, H. Wang, G. Zhou, X. Kan, Y. Zhang and Y. Zhao, Appl. Surf. Sci., 426, 812 (2017). 10.1016/j.apsusc.2017.07.257
49
J. Jiang, D. G. Lim, K. Ramadoss and S. Ramanathan, Solid-State Electron., 146, 13 (2018). 10.1016/j.sse.2018.04.009
50
D.-H. Kwon, K. M. Kim, J. H. Jang, J. M. Jeon, M. H. Lee, G. H. Kim, X.-S. Li, G.-S. Park, B. Lee and S. Han, Nat. Nanotechnol., 5, 148 (2010). 10.1038/nnano.2009.45620081847
51
U. Diebold, Surf. Sci. Rep., 48, 53 (2003). 10.1016/S0167-5729(02)00100-0
52
A. Janotti, J. Varley, P. Rinke, N. Umezawa, G. Kresse and C. Van de Walle, Phys. Rev. B, 81, 085212 (2010). 10.1103/PhysRevB.81.085212
53
J. J. Yang, F. Miao, M. D. Pickett, D. A. Ohlberg, D. R. Stewart, C. N. Lau and R. S. Williams, Nanotechnology, 20, 215201 (2009). 10.1088/0957-4484/20/21/21520119423925
54
T. Tsuruoka, K. Terabe, T. Hasegawa and M. Aono, Nanotechnology, 21, 425205 (2010). 10.1088/0957-4484/21/42/42520520864781
55
J. J. Yang, J. Borghetti, D. Murphy, D. R. Stewart and R. S. Williams, Adv. Mater., 21, 3754 (2009). 10.1002/adma.200900822
Information
  • Publisher :Materials Research Society of Korea
  • Publisher(Ko) :한국재료학회
  • Journal Title :Korean Journal of Materials Research
  • Journal Title(Ko) :한국재료학회지
  • Volume : 34
  • No :3
  • Pages :152-162
  • Received Date : 2024-02-16
  • Revised Date : 2024-03-20
  • Accepted Date : 2024-03-21