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2019 Vol.29, Issue 11 Preview Page
November 2019. pp. 670-676
Abstract
References
1.
W. Kern, J. Electrochem. Soc., 137, 1887 (1990).10.1149/1.2086825
2.
R. W. Davis, E. F. Moore and M. R. Zachariah, J. Cryst. Growth, 132, 513 (1993).10.1016/0022-0248(93)90079-C
3.
D. A. Neamen, Semiconductor Physics and Devies; 3rd Edition, p. 210-217, McGraw-Hill, McGraw-Hill Press, New York (2011).
4.
K. W. Nam, K. H. Shin, S. O. Jung and H. J. Kim, Study on fallen particles caused in CVD process, p. 831-32, in Proceedings of the Korean Society of Precision Engineering., Jeju, Korea (2012).
5.
S. O. Kasap, Principles of Electronic Materials and Devices, 3rd Edition, p. Ch5.16-5.18, McGraw-Hill, New York (2017).
6.
D. C. Burkman, C. A. Peterson, L. A. Zazzera and R. J. Kopp, Microcontamination, 6, 57 (1988).
7.
A. Khilnani, Particles on Surfaces 1: Detection, Adhesion, and Removal, p. 129-142, Plenum, Plenum Press, New York (1988).
8.
G. J. Slusser and L. MacDowell, J. Vac. Sci. Technol., A, 5, 1649 (1987).10.1116/1.574539
9.
J. R. Monkowski, Treatise on Clean Surface Technology, p. 123-148, Plenum, Plenum Press, New York (1987).10.1007/978-1-4684-9126-5_6
10.
W. Kern and G. L. Schnable, The Chemistry of the Semiconductor Industry, p. 225-280, Chapman and Hall, New York (1987).
11.
A. Licciardello, O. Puglisi and S. Pignataro, Appl. Phys. Lett., 48, 41 (1986).10.1063/1.96755
12.
J. Ruzyllo and E. Kamieniecki, Real-time in-line testing of semiconductor wafers, US Patent, 5[661] 408 (1997).
13.
K. M. Eisele and E. Klausmann, Solid State Technol., 27, 177 (1984).10.1016/0038-1101(84)90109-6
14.
W. T. Stacy, D. F. Allison and T. C. Wu, in Semi conductor Silicon 1981, p. 344, in Proceedings of the Journal of the Electrochemical Society., Pennington, NJ (1981).
15.
P. F. Schmidt and C. W. Pierce, J. Electrochem. Soc., 128, 630 (1981).10.1149/1.2127472
16.
Korean Intellectual Property Office, 10-2014-0139935.
17.
Korean Intellectual Property Office, 10-2015-0125378.
18.
Korean Intellectual Property Office, 10-2019-0004973.
19.
Korean Intellectual Property Office, 10-1296966.
20.
W. D. Kim and D. C. Han, J. KSLE. Soc., 8, 64 (1992).
21.
K. Rokkaku, JSPE. Soc., 54, 28 (1987).
22.
L. D. Wedeven and T. Harris, Machine Des., 59, 72 (1987).
23.
W. D. Kim, J. KSLE. Soc., 7, 7 (1991).
24.
I. H. Choi, C. N. Park, H. J. Choi, J. K. Lee and D. W. Shin, Rolling Fatigue Life of Silicon Nitride Ceramic Balls, p. 119–126 in Proceedings of the Korean Society of Tribologists And Lubrication Engineers., Daegu, Korea (1999).
25.
B. M. Kim, S. S. Kim, D. W. Shin and S. B. Yoon, Tribological Characteristics of Sliding contact between Deferent Combinations of Ceramics, p. 296-300 in Proceedings of the Korean Society of Tribologists And Lubrication Engineers., Daegu, Korea (2004).
26.
H. Aramaki, Y. Shoda, Y. Morishita and T. Sawamoto, J. Trib. Soc., 110, 693 (1988).10.1115/1.3261715
27.
B. M. Kim, S. S. Kim, D. W. Shin and S. B. Yoon, Tribological durability evaluation of structural ceramics on sliding contact, p. 193–198 in Proceedings of the Korean Society of Tribologists And Lubrication Engineers., Daegu, Korea (2004).
28.
J. E. Ban and K. W. Kim, J. KSLE. Soc., 14, 26 (1998).
29.
S. T. Jang and Y. Z. Lee, J. KSLE. Soc., 11, 11 (1995).
Information
  • Publisher :Materials Research Society of Korea
  • Publisher(Ko) :한국재료학회
  • Journal Title :Korean Journal of Materials Research
  • Journal Title(Ko) :한국재료학회지
  • Volume : 29
  • No :11
  • Pages :670-676
  • Received Date : 2019-09-02
  • Revised Date : 2019-09-27
  • Accepted Date : 2019-09-27