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2017 Vol.27, Issue 6
Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods

전자 사이클로트론 공명 플라즈마와 열 원자층 증착법으로 제조된 Al2O3 박막의 물리적·전기적 특성 비교

Dae-Gyu Yang*
,
Yang-Soo Kim*
,
Jong-Heon Kim
,
Hyoung-Do Kim
,
Hyun-Suk Kim†
양 대규*
,
김 양수*
,
김 종헌
,
김 형도
,
김 현석†
Department of Materials Science and Engineering, Chungnam National University, Daejeon 34134, Republic of Korea
충남대학교 신소재공학과
†Corresponding author E-Mail : khs3297@cnu.ac.kr (H.-S. Kim, Chungnam Nat’l Univ.)

* These authors contributed equally to this work.

June 2017. pp. 295-300
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Abstract

Aluminum-oxide(Al2O3) thin films were deposited by electron cyclotron resonance plasma-enhanced atomic layer deposition at room temperature using trimethylaluminum(TMA) as the Al source and O2 plasma as the oxidant. In order to compare our results with those obtained using the conventional thermal ALD method, Al2O3 films were also deposited with TMA and H2O as reactants at 280 °C. The chemical composition and microstructure of the as-deposited Al2O3 films were characterized by X-ray diffraction(XRD), X-ray photo-electric spectroscopy(XPS), atomic force microscopy(AFM) and transmission electron microscopy(TEM). Optical properties of the Al2O3 films were characterized using UV-vis and ellipsometry measurements. Electrical properties were characterized by capacitance-frequency and current-voltage measurements. Using the ECR method, a growth rate of 0.18 nm/cycle was achieved, which is much higher than the growth rate of 0.14 nm/cycle obtained using thermal ALD. Excellent dielectric and insulating properties were demonstrated for both Al2O3 films.

Keywords
aluminum oxide(Al2O3)
ECR
PE-CVD
thermal ALD
atomic layer deposition
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Information
  • Publisher :Materials Research Society of Korea
  • Publisher(Ko) :한국재료학회
  • Journal Title :Korean Journal of Materials Research
  • Journal Title(Ko) :한국재료학회지
  • Volume : 27
  • No :6
  • Pages :295-300
  • Received Date : 2016-11-11
  • Revised Date : 2017-03-16
  • Accepted Date : 2017-04-11
  • DOI :https://doi.org/10.3740/MRSK.2017.27.6.295
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