Effect of Rapid Thermal Annealing on the Electrical and Optical Properties of TiO2/Ag/TiO2 Thin Films

Daeil Kim; Jiho Kim; Byeong-Geun Park; Heon-Jo Lee; Young-Min Kong

doi:10.3740/MRSK.2025.35.4.162

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2025 Vol.35, Issue 4 Preview Page

Research Paper

Effect of Rapid Thermal Annealing on the Electrical and Optical Properties of TiO₂/Ag/TiO₂ Thin Films 급속열처리에 따른 TiO₂/Ag/TiO₂ 박막의 전기적, 광학적 특성

27 April 2025. pp. 162-165

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Abstract

TiO₂/Ag/TiO₂ (TAT) tri-layer films were deposited using radio frequency (RF) magnetron sputtering and direct current (DC) magnetron sputtering on a glass substrate, and then rapid thermal annealed at 150 and 300 °C for 10 minutes. The influence of annealing temperature on the optical and electrical properties of the films was investigated. As annealing temperature was rapidly increased from room temperature to 300 °C, the grain size of the TiO₂ (004), (204) and Ag (200) increased from 36.8, 14.3, 22.1 nm to 43.2, 16.6, 23.4 nm, respectively and the electrical resistivity decreased from 4.64 × 10^-5 Ω cm to 2.79 × 10^-5 Ω cm. Also, the average visible transmittance increased from 82.7 % to 84.9 %. In addition, the electromagnetic interference shielding effectiveness of TAT films was also increased to 31.7 db after annealing at 300 °C. These results demonstrate that post-deposition rapid thermal annealing is an effective method for enhancing the electrical and optical properties of TAT films.

Keywords

TiO₂/Ag/TiO₂

thin films

rapid thermal annealing

figure of merit

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Information

Publisher :Materials Research Society of Korea
Publisher(Ko) :한국재료학회
Journal Title :Korean Journal of Materials Research
Journal Title(Ko) :한국재료학회지
Volume : 35
No :4
Pages :162-165
Received Date : 2025-03-24
Revised Date : 2025-04-11
Accepted Date : 2025-04-11
DOI :https://doi.org/10.3740/MRSK.2025.35.4.162

Korean Journal of Materials Research ISSN:1225-0562(Print) 2287-7258(Online) 한국재료학회지

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