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2021 Vol.31, Issue 11 Preview Page
Structural Characteristics by Nitridation of Oxygen Added Cr Thin Films in NH3 Atmosphere

산소가 첨가된 Cr 박막의 NH3 분위기에서의 질화 처리에 의한 구조적 특성

Danbi Kim
,
Seontai Kim†
김 단비
,
김 선태†
Department of Materials Science and Engineering, Hanbat National University, Daejeon 34158, Republic of Korea
한밭대학교 신소재공학과
†Corresponding author E-Mail : stkim@hanbat.ac.kr (S. Kim, Hanbat Nat'l Univ.)
November 2021. pp. 635-641
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Abstract

Cr thin films with O added are deposited on sapphire substrate by DC sputtering and are nitrided in NH3 atmosphere between 300 and 900 °C for various times. X-ray diffraction results show that nitridation begins at 500 °C, forming CrN and Cr2N. Cr oxides of Cr2O3 are formed at 600 °C. And, at temperatures higher than 900 °C, the intermediate materials of Cr2N and Cr2O3 disappear and CrN is dominant. The atomic concentration ratios of Cr and O are 77% and 23%, respectively, over the entire thickness of as-deposited Cr thin film. In the sample nitrided at 600 °C, a CrN layer in which O is substituted with N is formed from the surface to 90 nm, and the concentrations of Cr and N in the layer are 60% and 40%, respectively. For this reason, CrN and Cr2N are distributed in the CrN region, where O is substituted with N by nitridation, and Cr oxynitrides are formed in the region below this. The nitridation process is controlled by inter-diffusion of O and N and the parabolic growth law, with activation energy of 0.69 eV.

Keywords
DC sputter
Cr thin-film
CrN
nitridation
inter-diffusion
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Information
  • Publisher :Materials Research Society of Korea
  • Publisher(Ko) :한국재료학회
  • Journal Title :Korean Journal of Materials Research
  • Journal Title(Ko) :한국재료학회지
  • Volume : 31
  • No :11
  • Pages :635-641
  • Received Date : 2021-08-25
  • Revised Date : 2021-08-25
  • Accepted Date : 2021-11-03
  • DOI :https://doi.org/10.3740/MRSK.2021.31.11.635
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