Abstract
References
Information
A J Van Roosmalen, J A G Baggerman and S J H Brader, Dry Etching for VLSI; 99, New York. Plenum Press. (1991)
10.1007/978-1-4899-2566-4_6R Doering and Y Nishi, Handbook of Semiconductor Manufacturing Technology; 21, New York. CRC Press. (2008)
D M Kim, K B Kim, S Y Yoon, Y S Oh, H T Kim and S M Lee, J. Ceram. Soc. Jpn, 117; 863 (2009)
10.2109/jcersj2.117.863R Ramos, G Cunge, B Pelissier and O Joubert, Plasma Sources Sci. Technol, 16; 711 (2007)
10.1088/0963-0252/16/4/004D M Kim, S Y Yoon, K B Kim, H S Kim, Y S Oh and S M Lee, J. Korean Ceram. Soc, 45; 707, (in Korean) (2008)
10.4191/KCERS.2008.45.1.707D M Kim, Y S Oh, S W Kim, H T Kim, D S Lim and S M Lee, Thin Solid Films, 519; 6698 (2011)
10.1016/j.tsf.2011.04.049S Beauvais, V Guipont, F Borit, M Jeandin, M Espanol, K A Khor, A Robisson and R Saenger, Surf. Coat. Technol, 183; 204 (2004)
10.1016/j.surfcoat.2003.08.078M Tului, G Marino and T Valente, Surf. Coat. Technol, 201; 2103 (2006)
10.1016/j.surfcoat.2006.04.053H K Seok, E Y Choi, P R Cha, M C Son and B Choi, Surf. Coat. Technol, 205; 3341 (2011)
10.1016/j.surfcoat.2010.10.045J Kitamura, H Ibe, F Yuasa and H Mizuno, J. Therm. Spray Soc, 17; 878 (2008)
10.1007/s11666-008-9285-yI Iwasawa, R Nishimizu, M Tokita, M Kiyohara and K Uematsu, J. Am. Ceram. Soc, 90; 2327 (2007)
10.1111/j.1551-2916.2007.01738.xD H Riu, S W Lee, Y K Jeong and S C Choi, Key Eng. Mater, 264-8; 601 (2004)
10.4028/www.scientific.net/KEM.264-268.601M Berkowski, P Bowen, T Liechti and H J Scheel, J. Am. Ceram. Soc, 75; 1005 (1992)
10.1111/j.1151-2916.1992.tb04175.x- Publisher :Materials Research Society of Korea
- Publisher(Ko) :한국재료학회
- Journal Title :Korean Journal of Materials Research
- Journal Title(Ko) :한국재료학회지
- Volume : 26
- No :5
- Pages :229-234
- Received Date : 2016-03-08
- Revised Date : 2016-04-01
- Accepted Date : 2016-04-05
- DOI :https://doi.org/10.3740/MRSK.2016.26.5.229


Korean Journal of Materials Research







