Interfacial and Optical Properties of CsPbBr3 Active Layer on Nanoporous GaN Electron Transport Layer

Kwang Jae Lee

doi:10.3740/MRSK.2026.36.6.225

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2026 Vol.36, Issue 6 Preview Page

Research Paper

Interfacial and Optical Properties of CsPbBr₃ Active Layer on Nanoporous GaN Electron Transport Layer 나노포러스 GaN 전자수송층 기반 CsPbBr₃ 활성층의 계면 및 광학적 특성 분석

27 June 2026. pp. 225-232

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Abstract

Nanoporous semiconductor structures provide a large interfacial area and tunable surface properties, enabling effective control of material/interface interactions. In this study, nanoporous GaN (NP GaN) was employed as an electron transport layer (ETL) to incorporate CsPbBr₃, and the resulting interfacial and optical characteristics were systematically investigated. NP GaN with a controlled pore fraction (ρ_pore = 3.7~36.8 %) was fabricated via electrochemical (EC) etching. Cross-sectional SEM analysis revealed that the pore morphology evolves significantly with etching time, forming vertically aligned porous networks with increased pore density, connectivity, and diameter, which enables efficient infiltration of the CsPbBr₃ precursor into the NP framework. Consequently, CsPbBr₃ on NP GaN exhibits higher photoluminescence (PL) intensity, reduced full width at half maximum (FWHM), and improved internal quantum efficiency (IQE) from 4.9 % to 15.6 %. Temperature-dependent PL (TDPL) analysis revealed suppressed thermal quenching, accompanied by increased activation energy and reduced non-radiative recombination. These results demonstrate that NP GaN effectively modulates interfacial structure and carrier recombination behavior, providing a viable strategy for enhancing the optical performance of perovskite materials.

Keywords

CsPbBr₃

nanoporous GaN

infiltration

photoluminescence

internal quantum efficiency

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Information

Publisher :Materials Research Society of Korea
Publisher(Ko) :한국재료학회
Journal Title :Korean Journal of Materials Research
Journal Title(Ko) :한국재료학회지
Volume : 36
No :6
Pages :225-232
Received Date : 2026-04-17
Revised Date : 2026-05-03
Accepted Date : 2026-05-06
DOI :https://doi.org/10.3740/MRSK.2026.36.6.225

Korean Journal of Materials Research ISSN:1225-0562(Print) 2287-7258(Online) 한국재료학회지

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