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ISSN : 1225-0562(Print)
ISSN : 2287-7258(Online)
Korean Journal of Materials Research Vol.17 No.2 pp.96-99
DOI :

Effects of Post-Annealing on Properties of HfO2 Films Grown by ALD

Lee, J.W., Ham, M.H., Maeng, W.J., Kim, H., Myoung, J.M.

Abstract


ALD법으로 성장한 HfO2 박막의 열처리에 따른 특성변화

이재웅, 함문호, 맹완주, 김형준, 명재민

초록